Mi-Hua Lin

Title: Mi-Hua Lin: Innovator in Semiconductor Technology

Introduction: Mi-Hua Lin is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on enhancing semiconductor structures, which are crucial for modern electronic devices.

Latest Patents: One of Mi-Hua Lin's latest patents is titled "Semiconductor structure with enlarged gate electrode structure and method for forming the same." This patent describes a semiconductor structure that includes a gate stack structure formed over a substrate. The gate stack structure features a gate electrode structure with a first portion and a second portion, along with a first conductive layer positioned below the gate electrode structure. Notably, the first portion of the gate electrode structure is situated over the second portion, and the width of the top surface of the first portion is greater than that of the bottom surface of the second portion.

Career Highlights: Mi-Hua Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has positioned him as a key player in the development of advanced semiconductor technologies.

Collaborations: Mi-Hua Lin has collaborated with notable colleagues, including Bo-Wen Hsieh and Wen-Jia Hsieh, who contribute to the dynamic environment of innovation within their field.

Conclusion: Mi-Hua Lin's contributions to semiconductor technology exemplify the impact of innovation in the electronics industry. His patents and collaborations continue to shape the future of semiconductor design and manufacturing.