Racine, WI, United States of America

Merlin L Mulvey

This inventor holds 2 USPTO granted patents. Top assignees: Printing Development Inc., Printing Developments, Inc.. Active years: 1999-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Merlin L Mulvey. Retrieved from https://idiyas.com/inventor/merlin-l-mulvey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 1999-2000

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2 patents (USPTO):Explore Patents

Title: Innovations by Merlin L. Mulvey in Photoresist Technology

Introduction

Merlin L. Mulvey, an inventive mind based in Racine, Wisconsin, has made significant contributions to the field of printing technology, particularly in the development of photoresists. With a total of two patents to his name, Mulvey's work focuses on creating efficient methods for making printing plates that reflect advancements in sensitivity and processing times.

Latest Patents

Mulvey's latest patents center around the development of photoresists and methods for creating printing plates. These innovations allow for printing plates to have a photoresist layer that can be easily exposed by a computer-controlled laser. This technology boasts improved sensitivity and eliminates the need for traditional photomask steps. The unique composition of the photoresists includes a film-forming polymer, an organo azide, and a photosensitive dye that absorbs light at the wavelength of the patterning laser. This reaction converts light energy into heat, raising the temperature of the organo azide above its dissociation point, subsequently dissolving the azide in the areas exposed to the laser. The unexposed regions can be hardened through a post-pattern exposure with ultraviolet light, significantly enhancing the resist's durability against etching solvents.

Career Highlights

Throughout his career, Mulvey has worked with notable firms such as Printing Developments, Inc. and Printing Development Inc., where he applied his expertise to drive innovations in printing technologies. His work has not only led to the patented methods but has also laid foundations for future advancements in the industry.

Collaborations

In his journey, Mulvey has collaborated with skilled professionals like Bruce Holman III and Jeffrey George Zaloom. These partnerships have played an essential role in enhancing the effectiveness and reach of his innovations in the printing sector.

Conclusion

Merlin L. Mulvey’s contributions to photoresist technology have set a new standard in the manufacturing of printing plates. His patented methods reflect a deep understanding of material science and printing processes, paving the way for further innovations within the field. Through collaboration and dedication to his craft, Mulvey continues to influence the domain of printing technology significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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