Shanghai, China

Mengshi Lu

This inventor holds 1 USPTO granted patent. Top assignee: Honeywell International Inc.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mengshi Lu. Retrieved from https://idiyas.com/inventor/mengshi-lu-4dgw9aa3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Mengshi Lu - Innovator in Gas Separation Technology.

Introduction

Mengshi Lu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of gas separation technology. His innovative work has led to the development of advanced materials that enhance the efficiency of gas separation processes.

Latest Patents

Mengshi Lu holds a patent for thin film gas separation membranes. This gas separation membrane comprises aromatic polyimide polymers that include a plurality of repeating units of a specific formula. His invention aims to improve the performance and effectiveness of gas separation applications.

Career Highlights

Mengshi Lu is currently employed at Honeywell International Inc., a leading company in technology and manufacturing. His role at Honeywell allows him to apply his expertise in developing cutting-edge solutions for various industrial applications.

Collaborations

Throughout his career, Mengshi Lu has collaborated with notable colleagues, including Jeffrey Han and Zhongxi Huang. These partnerships have fostered innovation and contributed to the advancement of gas separation technologies.

Conclusion

Mengshi Lu's work in gas separation technology exemplifies the impact of innovative thinking in addressing industrial challenges. His contributions continue to shape the future of gas separation processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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