Meng-Huei Lui

Title: Innovations of Meng-Huei Lui in Semiconductor Technology

Introduction

Meng-Huei Lui is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of dual damascene patterning. His innovative work has led to the development of a unique patent that addresses critical challenges in the manufacturing process.

Latest Patents

Meng-Huei Lui holds a patent for a "Multi-purpose composite mask for dual damascene patterning." This method is designed to form dual damascene structures using a composite mask that prevents via poisoning and enhances lithographic characteristics. The composite mask consists of silicon-based and polymeric dielectric layers. The polymeric dielectric component protects via openings by conformally covering the sidewalls and allows for better control over the height of the protective dielectric. Additionally, this layer serves as the main plasma resisting layer during trench etching, enabling a thinner photoresist and extending the lithography process window.

Career Highlights

Meng-Huei Lui is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor manufacturing.

Collaborations

Meng-Huei has collaborated with Mei-Hui Sung, a talented coworker who has also contributed to the field. Their partnership exemplifies the collaborative spirit that drives innovation in technology.

Conclusion

Meng-Huei Lui's contributions to semiconductor technology, particularly through his patent on multi-purpose composite masks, highlight his role as an influential inventor in the industry. His work continues to pave the way for advancements in manufacturing processes.