Melisa J Buie

Title: Melisa J Buie: Innovator in Photomask Technology

Introduction

Melisa J Buie is a prominent inventor based in San Jose, CA (US). She has made significant contributions to the field of photomask technology, holding a total of 6 patents. Her work focuses on innovative methods and apparatuses that enhance the precision and efficiency of photolithographic processes.

Latest Patents

Among her latest patents, Melisa has developed a multi-step process for etching photomasks. This method and apparatus are designed for etching a metal layer on a substrate, such as a photolithographic reticle. The process involves positioning the reticle on a support member in a processing chamber, etching the substrate with an oxygen-free processing gas, and subsequently with an oxygen-containing processing gas. Additionally, she has patented integrated phase angle and optical critical dimension measurement metrology for feed-forward and feedback process control. This innovation allows for real-time adjustments to the process recipe based on critical dimensions measurement data collected before and after wafer processing.

Career Highlights

Melisa J Buie is currently employed at Applied Materials, Inc., where she continues to push the boundaries of photomask technology. Her expertise has led to advancements that significantly improve the control and monitoring of critical dimensions in photolithography.

Collaborations

Throughout her career, Melisa has collaborated with notable colleagues, including Brigitte C Stoehr and Cynthia B Brooks. These partnerships have fostered an environment of innovation and have contributed to the success of her projects.

Conclusion

Melisa J Buie's contributions to photomask technology exemplify her dedication to innovation in the field. Her patents and career achievements highlight her role as a leading inventor in this critical area of technology.