Mei Po (Mabel) Yeung

Title: Innovations of Mei Po (Mabel) Yeung

Introduction

Mei Po (Mabel) Yeung is a notable inventor based in San Jose, CA (US). She has made significant contributions to the field of plasma reactor technology. Her innovative work focuses on enhancing the efficiency and uniformity of etching processes in semiconductor manufacturing.

Latest Patents

Mei Po (Mabel) Yeung holds a patent for a "Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products." This invention involves a plasma reactor designed for processing a workpiece within a reactor chamber. The reactor features a wafer support pedestal and process gas injection apparatus. It includes an RF bias power generator and a source power applicator, which are crucial for achieving optimal etching results. The patent emphasizes the importance of a filter that enhances the uniformity of the etch rate across the wafer and from reactor to reactor.

Career Highlights

Yeung is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work at Applied Materials has allowed her to develop and refine technologies that are essential for modern manufacturing processes.

Collaborations

Throughout her career, Mei Po (Mabel) Yeung has collaborated with esteemed colleagues, including John Pipitone and Kenneth D Smyth. These collaborations have contributed to her innovative projects and advancements in the field.

Conclusion

Mei Po (Mabel) Yeung is a pioneering inventor whose work in plasma reactor technology has made a significant impact on the semiconductor industry. Her contributions continue to drive innovation and efficiency in manufacturing processes.