San Jose, CA, United States of America

Mehrdad Moshfegh


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Innovations of Mehrdad Moshfegh in Plasma CVD Technology

Introduction

Mehrdad Moshfegh is a notable inventor based in San Jose, CA, who has made significant contributions to the field of semiconductor processing. His work primarily focuses on enhancing the efficiency and effectiveness of chemical vapor deposition (CVD) technologies. With a patent portfolio that includes innovative designs, Moshfegh continues to push the boundaries of what is possible in thin film technology.

Latest Patents

One of Moshfegh's key patents is titled "Upper chamber for high density plasma CVD." This invention is directed towards an upper chamber design of a plasma CVD chamber that provides more uniform conditions for forming thin CVD films on a substrate. The patent outlines improvements in temperature control of the upper chamber, which enhances particle performance by minimizing temperature fluctuations during deposition and non-deposition cycles. The apparatus described in the patent includes a chamber defining a plasma processing region, featuring a bottom, a side wall, and a dome with a substantially flat dome top. A top RF coil is positioned above the dome, and a cold plate is also included, both of which are larger than the substrates being processed.

Career Highlights

Moshfegh is currently associated with Applied Materials, Inc., a leading company in the semiconductor equipment industry. His role at the company allows him to apply his innovative ideas and contribute to advancements in semiconductor manufacturing technologies.

Collaborations

Throughout his career, Moshfegh has collaborated with talented individuals such as Sudhir R Gondhalekar and Tom K Cho. These collaborations have likely enriched his work and led to further innovations in the field.

Conclusion

In summary, Mehrdad Moshfegh is a prominent inventor whose work in plasma CVD technology has the potential to significantly impact the semiconductor industry. His innovative designs and patents reflect his commitment to advancing technology in this critical field.

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