Rahway, NJ, United States of America

Mehmet U Yener

This inventor holds 2 USPTO granted patents. Top assignee: Hoechst Celanese Corporation. Active years: 1988-1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mehmet U Yener. Retrieved from https://idiyas.com/inventor/mehmet-u-yener

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 60(Granted Patents)


Company Filing History:


Years Active: 1988-1991

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2 patents (USPTO):Explore Patents

Title: Innovations of Mehmet U Yener

Introduction

Mehmet U Yener is a notable inventor based in Rahway, NJ (US). He has made significant contributions to the field of imaging technology, holding a total of 2 patents. His work focuses on methods and materials that enhance the protection and quality of images.

Latest Patents

Among his latest patents, one is titled "Protected color image on substrate with thermal adhesive." This invention addresses the need for durable and high-quality photographic articles. Another significant patent is "Protective coating for images," which provides a method for safeguarding images by applying a colored image on a substrate.

Career Highlights

Mehmet U Yener is currently employed at Hoechst Celanese Corporation, where he continues to innovate in the field of imaging. His work has been instrumental in developing new technologies that improve image protection and quality.

Collaborations

Throughout his career, Yener has collaborated with notable colleagues, including Stephan J Platzer and Stanley F Wanat. These partnerships have contributed to the advancement of his inventions and the overall progress in imaging technology.

Conclusion

Mehmet U Yener's contributions to the field of imaging through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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