Company Filing History:
Years Active: 2017
Title: Megumu Saitou: Innovator in Plasma Processing Technology
Introduction
Megumu Saitou is a notable inventor based in Shunan, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus.
Latest Patents
Megumu Saitou holds 1 patent for his invention of a plasma processing apparatus. This apparatus includes a vacuum processing chamber designed for applying plasma processing to a sample. It features a sample stage within the chamber for mounting the sample, induction antennas located outside the chamber, and a radio-frequency power supply that powers the induction antennas. Additionally, the apparatus incorporates a Faraday shield that is capacitively coupled with the plasma. A radio-frequency voltage is applied to the Faraday shield from the power supply via a matching box, which contains a series LC circuit with a variable capacitor and an inductor. The system also includes a motor control unit for managing the variable capacitor and a radio-frequency voltage detection unit for monitoring the voltage applied to the Faraday shield. The matching box executes feedback control over the radio-frequency voltage.
Career Highlights
Megumu Saitou is currently employed at Hitachi High-Technologies Corporation, where he continues to advance his research and development efforts in plasma processing technology. His work has been instrumental in enhancing the efficiency and effectiveness of plasma processing applications.
Collaborations
Some of his notable coworkers include Masaharu Gushiken and Ryoji Nishio. Their collaborative efforts contribute to the innovative environment at Hitachi High-Technologies Corporation.
Conclusion
Megumu Saitou's contributions to plasma processing technology exemplify the spirit of innovation. His patent for the plasma processing apparatus showcases his commitment to advancing this field. Through his work, he continues to influence the future of plasma processing applications.