Hitachi, Japan

Megumi Naruse

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1990.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Megumi Naruse: Innovator in Electrophotographic Technology

Introduction

Megumi Naruse is a prominent inventor based in Hitachi, Japan. She has made significant contributions to the field of electrophotographic technology, particularly through her innovative patent. Her work focuses on enhancing the performance and longevity of electrophotographic photosensitive devices.

Latest Patents

Naruse holds a patent for a "Method of annealing electrophotographic photosensitive device." This invention involves an electrophotographic photosensitive device that includes an electroconductive support, a photoconductive layer, and a surface protective layer. The surface protective layer is designed to have a density of localized states of not more than 5×1017 cm-3 and a higher dark resistance than that of the photoconductive layer. This innovation results in a surface protective layer that is less susceptible to deterioration, enhances adhesion to the photoconductive layer, and ultimately prolongs the device's life. Naruse's patent is a testament to her expertise and dedication to advancing technology in this area.

Career Highlights

Throughout her career, Megumi Naruse has been associated with Hitachi, Ltd., where she has contributed to various projects and innovations. Her work has not only advanced the technology but has also positioned her as a key figure in her field.

Collaborations

Naruse has collaborated with notable colleagues, including Mitsuo Chigasaki and Masanobu Hanazono. These collaborations have further enriched her work and contributed to the development of innovative solutions in electrophotographic technology.

Conclusion

Megumi Naruse is a distinguished inventor whose contributions to electrophotographic technology have made a significant impact. Her innovative patent demonstrates her commitment to enhancing device performance and longevity. Her work continues to inspire advancements in the field.

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