This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Lam Research Corporation. Active years: 2019.
Company Filing History:
Years Active: 2019
Title: Megha Rathod: Innovator in Interconnect Technology
Introduction
Megha Rathod is a prominent inventor based in Fremont, CA (US). She has made significant contributions to the field of interconnect technology, particularly in the development of diffusion barriers and adhesion layers.
Latest Patents
Megha holds a patent for the "Selective deposition of WCN barrier/adhesion layer for interconnect." This innovative method involves the selective deposition of tungsten carbon nitride (WCN) films on oxide surfaces, which is crucial for enhancing the performance of cobalt (Co) and ruthenium (Ru) interconnects. The technology significantly reduces contact resistance at interfaces while ensuring excellent film coverage and adhesion properties.
Career Highlights
Megha is currently employed at Lam Research Corporation, where she continues to advance her research and development efforts. Her work focuses on improving the efficiency and reliability of interconnects in semiconductor devices.
Collaborations
Megha collaborates with talented professionals in her field, including Jeong-Seok Na and Chiukin Steven Lai. Their combined expertise contributes to the innovative solutions being developed at Lam Research Corporation.
Conclusion
Megha Rathod is a trailblazer in the realm of interconnect technology, with her patent showcasing her commitment to innovation. Her work not only enhances the performance of semiconductor devices but also sets a benchmark for future advancements in the industry.