Boulder, CO, United States of America

Megan W Mescher

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Apyx Medical Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Megan W Mescher. Retrieved from https://idiyas.com/inventor/megan-w-mescher

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Megan W Mescher - Innovator in Cold Plasma Technology

Introduction

Megan W Mescher is an accomplished inventor based in Boulder, CO (US). She is currently associated with Apyx Medical Corporation, where she focuses on developing innovative solutions in the field of medical technology. Although she has not yet been granted any patents, her work is significant in advancing the application of cold plasma technology in skin resurfacing.

Latest Patent Applications

Megan's notable patent application is titled "Apparatus and Method for Cold Plasma Skin Resurfacing." This application describes an innovative apparatus and method that includes a mask designed for fractionated skin resurfacing. The mask features a plurality of apertures distributed across its surface, allowing for targeted treatment. It is made from a flexible material with an adhesive surface, enabling it to conform to the contours of a patient's skin while remaining securely in place. The material is also resistant to the effects of a cold plasma beam, ensuring effective treatment. The cold plasma beam applicator can scan or apply the beam over the mask, treating only the areas of skin exposed by the apertures.

Conclusion

Megan W Mescher is making strides in the field of medical technology with her innovative approaches to cold plasma skin resurfacing. Her contributions, although not yet reflected in granted patents, hold promise for future advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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