Vestal, NY, United States of America

Megan Fegley

This inventor holds 2 USPTO granted patents. Top assignees: The State University of New York, Crysta-Lyn Chemical Company, Inc.. Active years: 2018-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Megan Fegley. Retrieved from https://idiyas.com/inventor/megan-fegley

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2018-2019

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2 patents (USPTO):Explore Patents

Title: Megan Fegley: Innovator in Optical Absorber Technology

Introduction

Megan Fegley is a notable inventor based in Vestal, NY (US). She has made significant contributions to the field of optical absorbers, holding 2 patents that enhance the thermal stability of these materials. Her work is pivotal in advancing technologies that rely on optical absorbers.

Latest Patents

Fegley's latest patents focus on compositions for increasing the thermal stability of optical absorbers. These compositions include an optical absorber bound to a metal or a metal oxide through one or more linkers that contain a metal binding moiety. The methods of making and using these compositions are also detailed in her patents, showcasing her innovative approach to improving optical materials.

Career Highlights

Throughout her career, Megan has worked with esteemed organizations such as the State University of New York and Crysta-lyn Chemical Company, Inc. Her experience in these institutions has allowed her to develop and refine her expertise in optical technology.

Collaborations

Megan has collaborated with notable colleagues, including William E Bernier and Bradley Galusha. These partnerships have contributed to her success and the advancement of her research.

Conclusion

Megan Fegley is a distinguished inventor whose work in optical absorbers is making a significant impact in the field. Her patents and collaborations reflect her dedication to innovation and excellence in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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