Yorktown, VA, United States of America

Meelan M Choudhan

This inventor holds 1 USPTO granted patent. Top assignee: United States of America as Represented by the Administrator of NASA. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Meelan M Choudhan. Retrieved from https://idiyas.com/inventor/meelan-m-choudhan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2015

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Meelan M Choudhan: Innovator in Aircraft Noise Reduction Technology

Introduction

Meelan M Choudhan is a notable inventor based in Yorktown, VA (US). He has made significant contributions to the field of aerospace engineering, particularly in the area of noise reduction technology for aircraft.

Latest Patents

Choudhan holds a patent for "Flap edge noise reduction fins." This innovative design involves a flap that is movably connected to an aircraft wing, providing enhanced control during flight. The flap features opposite ends, with one end incorporating a series of substantially rigid, laterally extending protrusions. These protrusions create fluidly interconnected passageways that help manage airflow, thereby reducing noise generated by the flap's movement.

Career Highlights

Choudhan is currently employed by the United States of America as Represented by the Administrator of NASA. His work focuses on advancing technologies that improve aircraft performance and reduce environmental impact.

Collaborations

Choudhan collaborates with fellow inventor Mehdi R Khorrami, contributing to innovative projects within the aerospace sector.

Conclusion

Meelan M Choudhan's work in developing noise reduction technology for aircraft demonstrates his commitment to innovation in aerospace engineering. His contributions are paving the way for quieter and more efficient flight experiences.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…