Utsunomiya, Japan

Mayumi Nagaosa

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Kao Corporation. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mayumi Nagaosa. Retrieved from https://idiyas.com/inventor/mayumi-nagaosa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Mayumi Nagaosa: Innovator in Wearable Technology

Introduction

Mayumi Nagaosa is a prominent inventor based in Utsunomiya, Japan. She has made significant contributions to the field of wearable technology, particularly with her innovative designs that enhance user experience and functionality.

Latest Patents

Nagaosa holds a patent for a wearable article equipped with a sensor. This urination sensor features a printing substrate made of a resin film and includes a plurality of planar printed electrodes created using electroconductive ink. The design incorporates a section where the printing substrate is absent, allowing for an air-passage opening that retains functionality. The sensor is covered by a protective cover sheet, ensuring durability and effectiveness in its application.

Career Highlights

Throughout her career, Mayumi Nagaosa has demonstrated a commitment to advancing technology in wearable devices. Her innovative approach has led to the development of practical solutions that address everyday challenges faced by users.

Collaborations

Nagaosa has worked alongside notable colleagues, including Kazuo Ohashi and Hideko Goshowaki, contributing to a collaborative environment that fosters creativity and innovation.

Conclusion

Mayumi Nagaosa's work in wearable technology exemplifies her dedication to innovation and problem-solving. Her contributions continue to impact the field positively, showcasing the importance of creativity in technology development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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