Mayasari Lim

Title: Innovative Contributions of Mayasari Lim in Plasma Processes

Introduction

Mayasari Lim is an accomplished inventor based in London, GB, known for his significant contributions to the field of chemical vapor deposition and plasma etch processes. He holds a total of two patents that demonstrate his innovative approaches in preventing structure erosion during gap filling and enhancing etch process repeatability.

Latest Patents

Lim's latest patents are groundbreaking in the semiconductor manufacturing industry. One of his key inventions is the patent for a "Process modulation to prevent structure erosion during gap fill - High density plasma chemical vapor deposition and etch back processes." This innovation enables the effective filling of high aspect ratio gaps without causing liner erosion or damaging underlying structures by modulating the characteristics of the deposition process. By introducing reactive gases in a gradient manner and strategically timing the application of bias power, he has found a way to carefully control the transitions between various steps in the process, thus preventing unwanted structure erosion.

The second patent, titled "Method for controlling etch process repeatability," focuses on plasma etch processes that incorporate chemistries including hydrogen. This method is particularly effective for filling high aspect ratio and narrow width gaps while enhancing uniformity and reducing issues related to chamber loading and redeposition. Lim's innovative approach marks a significant advancement over conventional deposition-etch-deposition processes, reaffirming his reputation as a pioneer in the field.

Career Highlights

Mayasari Lim is currently affiliated with Novellus Systems Incorporated, a leading company in the field of advanced semiconductor manufacturing equipment. His work at Novellus has positioned him among the forefront of technological advancements in plasma processing. Lim's keen understanding of complex deposition and etch processes has not only led to successful patents but also contributes to the operational efficiency and effectiveness of manufacturing processes in the semiconductor industry.

Collaborations

Throughout his career, Lim has had the opportunity to collaborate with notable colleagues, including Vishal Gauri and George D Papasouliotis. These collaborations have allowed for the exchange of ideas and techniques that enhance the development of innovative solutions within the field. Working together with professionals who share a passion for innovation enables Lim to stay at the cutting edge of technological advancements.

Conclusion

Mayasari Lim's innovative contributions to plasma processes highlight his dedication to addressing the challenges faced in semiconductor manufacturing. With two significant patents to his name, Lim continues to make a meaningful impact on the industry. His collaborative efforts with esteemed colleagues further enhance his ability to innovate and lead in this rapidly evolving field. His work not only paves the way for improved manufacturing processes but also inspires future advancements in technology.