Maxime Lebugle

Title: Maxime Lebugle: Innovator in Surface-Relief Grating Technology

Introduction

Maxime Lebugle is a notable inventor based in Villigen, Switzerland. He has made significant contributions to the field of photolithography, particularly in the development of methods for creating surface-relief gratings. His innovative approach has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Maxime Lebugle holds a patent for a "Method and apparatus for printing a periodic pattern with a varying duty cycle." This invention involves a sophisticated method for forming a surface-relief grating with a desired spatial variation of duty cycle in a layer of photoresist. The process includes the use of two masks, where the first mask bears a high-resolution grating of linear features, and the second mask features a variable-transmission grating. The arrangement and illumination of these masks allow for precise control over the exposure of the photoresist, resulting in high-quality surface-relief structures.

Career Highlights

Maxime Lebugle is currently associated with Eulitha AG, a company known for its advancements in photonic technologies. His work at Eulitha AG has positioned him as a key player in the field, contributing to the company's reputation for innovation and excellence. His patent reflects his commitment to pushing the boundaries of technology and enhancing the capabilities of photolithography.

Collaborations

Maxime collaborates with talented individuals such as Francis Clube and Andreas Amrein. Their combined expertise fosters a creative environment that drives innovation and leads to groundbreaking developments in their field.

Conclusion

Maxime Lebugle's contributions to the field of surface-relief grating technology exemplify the spirit of innovation. His patent and work at Eulitha AG highlight his role as a significant inventor in the industry.