Moissy Cramayel, France

Maxime Lebegue

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Safran Nacelles. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maxime Lebegue. Retrieved from https://idiyas.com/inventor/maxime-lebegue-v8nb2fkx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Maxime Lebegue: Innovator in Patch Application Technology

Introduction

Maxime Lebegue is a notable inventor based in Moissy Cramayel, France. He has made significant contributions to the field of technology, particularly in the area of patch application systems. His innovative approach has led to the development of a unique method that enhances the efficiency of applying patches.

Latest Patents

Maxime holds 1 patent for his invention titled "Method and system for controlling the application of a patch." This patent outlines a method for controlling the application of a patch, which includes several systematic steps designed to improve the overall process.

Career Highlights

Maxime is currently employed at Safran Nacelles, a company known for its expertise in aerospace propulsion systems. His role at the company allows him to apply his innovative ideas in a practical setting, contributing to advancements in the aerospace industry.

Collaborations

Maxime collaborates with his coworker, Clément Rolland, to further enhance their projects and share insights that drive innovation within their field.

Conclusion

Maxime Lebegue's work exemplifies the spirit of innovation in technology, particularly in the application of patches. His contributions are paving the way for advancements in the industry, showcasing the importance of inventive thinking in practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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