This inventor holds 2 USPTO granted patents. Top assignees: Weiland-Werke Ag, Wieland-Werke Ag. Active years: 1987-1989.
Company Filing History:
Years Active: 1987-1989
Title: Max Bletschacher: Innovator in Copper-Chromium-Titanium-Silicon Alloys
Introduction
Max Bletschacher is a notable inventor based in Munich, Germany. He has made significant contributions to the field of materials science, particularly in the development of copper-chromium-titanium-silicon alloys. With a total of two patents to his name, Bletschacher's work has implications for various electronic applications.
Latest Patents
Bletschacher's latest patents focus on innovative copper-chromium-titanium-silicon alloys. The first patent describes an alloy consisting of 0.10 to 0.50% chromium, 0.01 to 0.25% titanium, and silicon, with the remainder being copper and usual impurities. This alloy is characterized by a silicon content that is more than 0.1 times the titanium content. The second patent elaborates on a similar alloy, which consists of 0.1 to 0.5% chromium, 0.05 to 0.5% titanium, and 0.01 to 0.1% silicon. This alloy is noted for its excellent electrical and thermal conductivity, mechanical strength, resistance to softening, homogeneity, and flexibility, making it suitable for electronic components, particularly semiconductor carriers for transistors and integrated circuits.
Career Highlights
Throughout his career, Bletschacher has worked with prominent companies such as Wieland-Werke AG. His experience in the industry has allowed him to refine his expertise in alloy development and application.
Collaborations
Bletschacher has collaborated with notable colleagues, including Wolfgang Duerrschnabel and Franz J. Puckert. These collaborations have contributed to the advancement of his research and innovations in materials science.
Conclusion
Max Bletschacher's contributions to the field of copper-chromium-titanium-silicon alloys highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving materials for electronic applications, showcasing the importance of his work in the industry.
