Bear, DE, United States of America

Mauricio E Guzman

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.2

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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4 patents (USPTO):Explore Patents

Title: Mauricio E Guzman: Innovator in CMP Polishing Technology

Introduction

Mauricio E Guzman is a notable inventor based in Bear, Delaware, specializing in chemical mechanical polishing (CMP) technology. He holds a total of 4 patents that contribute significantly to advancements in the field. His work focuses on developing innovative polishing pads that enhance the efficiency and effectiveness of CMP processes.

Latest Patents

Guzman's latest patents include a CMP polishing pad with a window having transparency at low wavelengths and a material useful in such a window. This polishing pad is designed to improve chemical mechanical polishing by incorporating a transparent window secured within an opening in the pad. The window is made from a polyurethane composition that is carefully formulated to ensure optimal performance. Another significant patent is for a CMP polishing pad with a uniform window, which features a top surface with a pattern that enhances deflection into a cavity during polishing. These innovations reflect Guzman's commitment to improving CMP technology.

Career Highlights

Mauricio E Guzman is currently employed at Rohm and Haas Electronic Materials CMP Holdings, Inc., where he applies his expertise in developing advanced polishing solutions. His contributions to the field have been recognized through his patents, which demonstrate his innovative approach to solving complex challenges in CMP processes.

Collaborations

Guzman has collaborated with notable colleagues, including Matthew R Gadinski and Nestor A Vasquez, who share his passion for innovation in the CMP industry. Their teamwork has led to the development of cutting-edge technologies that push the boundaries of what is possible in polishing applications.

Conclusion

Mauricio E Guzman is a distinguished inventor whose work in CMP polishing technology has made a significant impact on the industry. His innovative patents and collaborations highlight his dedication to advancing the field and improving the efficiency of chemical mechanical polishing processes.

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