Eindhoven, Netherlands

Maurice Andreas Wilhelmina Deuss

This inventor holds 1 USPTO granted patent. Top assignee: Koninklijke Philips Corporation N.v.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maurice Andreas Wilhelmina Deuss. Retrieved from https://idiyas.com/inventor/maurice-andreas-wilhelmina-deuss

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Maurice Andreas Wilhelmina Deuss: Display Innovation

Introduction

Maurice Andreas Wilhelmina Deuss is an inventor associated with Eindhoven, the Netherlands, and Koninklijke Philips Corporation N.V. His recorded patent concerns a display arrangement designed to reduce mechanical stress.

Latest Patents

Deuss is credited with 1 patent: “Display Arrangement with Reduced Mechanical Stress.” The invention describes a cathode-ray tube containing a mask with at least one curved outer edge. A diaphragm arrangement attaches part of the mask’s curved edge to the tube. It includes an elongated folded sheet with straight and curved folds, shaped to connect the mask edge while minimizing inherent mechanical stress. The patent notes that a varying folding angle and a suitably curved transition can help achieve a stress-free sheet.

Career Highlights

Deuss’s listed patent reflects work on the mechanical design of display components. Its focus is the diaphragm structure that supports a curved mask edge while reducing stress within the assembly.

Collaborations

Deuss’s listed coworkers include Wilhelmus Marinus Maria Van De Steen and Rudolf Maria Jozef Voncken. The patent record associates his work with Koninklijke Philips Corporation N.V.

Conclusion

Maurice Andreas Wilhelmina Deuss’s recorded invention addresses a specific engineering challenge in cathode-ray tube displays by shaping a folded diaphragm to support a curved mask edge with reduced mechanical stress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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