Vtt, Finland

Matti Putkonen

This inventor holds 1 USPTO granted patent. Top assignee: Teknologian Tutkimuskeskus VTT Oy. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matti Putkonen. Retrieved from https://idiyas.com/inventor/matti-putkonen-pmvgz9l4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations of Matti Putkonen

Introduction

Matti Putkonen is a notable inventor based in VTT, Finland. He has made significant contributions to the field of catalytic nanocoatings. His innovative methods have the potential to enhance various industrial applications.

Latest Patents

Matti Putkonen holds a patent for a "Method for forming catalytic nanocoating." This method involves pretreating the surface of a metal plate through heat treatment at temperatures ranging from 500 to 800°C. The process includes forming a metal oxide support by washcoating the surface and depositing catalytically active metals and/or metal oxides using an atomic layer deposition (ALD) method. This results in a thin and conformal catalyst layer on the metal plate.

Career Highlights

Matti Putkonen is associated with Teknologian Tutkimuskeskus VTT Oy, where he has been instrumental in advancing research in catalytic technologies. His work has garnered attention for its innovative approach to enhancing catalytic efficiency.

Collaborations

Matti has collaborated with esteemed colleagues such as Pekka Simell and Matti Reinikainen. Their combined expertise has contributed to the success of various projects within the research institution.

Conclusion

Matti Putkonen's contributions to the field of catalytic nanocoatings exemplify the impact of innovative research in technology. His patent and collaborative efforts highlight the importance of advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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