Company Filing History:
Years Active: 2003
Title: Matthias Zierbock: Innovator in Electron Beam Technology
Introduction
Matthias Zierbock is a notable inventor based in Graitschen, Germany. He has made significant contributions to the field of lithography, particularly in the method of directing electron beams onto substrate surfaces. His innovative approach has implications for various applications in technology and manufacturing.
Latest Patents
Zierbock holds a patent for a "Method for directing an electron beam onto a target position on a substrate surface." This patent showcases his expertise in precision engineering and his commitment to advancing lithography techniques. He has 1 patent to his name, reflecting his focused contributions to the field.
Career Highlights
Matthias Zierbock is currently employed at Leica Microsystems Lithography GmbH, a company renowned for its cutting-edge technology in the field of lithography. His role at the company allows him to work on innovative projects that push the boundaries of electron beam technology.
Collaborations
Throughout his career, Zierbock has collaborated with talented professionals such as Rainer Plontke and Ines Stolberg. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Matthias Zierbock is a distinguished inventor whose work in electron beam technology has made a significant impact in the field of lithography. His contributions continue to influence advancements in precision engineering and manufacturing processes.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.