This inventor holds 1 USPTO granted patent. Top assignee: Leica Microsystems Lithography Gmbh. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Matthias Zierbock: Innovator in Electron Beam Technology
Introduction
Matthias Zierbock is a notable inventor based in Graitschen, Germany. He has made significant contributions to the field of lithography, particularly in the method of directing electron beams onto substrate surfaces. His innovative approach has implications for various applications in technology and manufacturing.
Latest Patents
Zierbock holds a patent for a "Method for directing an electron beam onto a target position on a substrate surface." This patent showcases his expertise in precision engineering and his commitment to advancing lithography techniques. He has 1 patent to his name, reflecting his focused contributions to the field.
Career Highlights
Matthias Zierbock is currently employed at Leica Microsystems Lithography GmbH, a company renowned for its cutting-edge technology in the field of lithography. His role at the company allows him to work on innovative projects that push the boundaries of electron beam technology.
Collaborations
Throughout his career, Zierbock has collaborated with talented professionals such as Rainer Plontke and Ines Stolberg. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Matthias Zierbock is a distinguished inventor whose work in electron beam technology has made a significant impact in the field of lithography. His contributions continue to influence advancements in precision engineering and manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile