Bensheim, Germany

Matthias Sattler

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent and 4 EPO patents. Top assignee: Hein, Lehmann Gmbh. Active years: 2021.


% Patents Active = 100.0


 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Matthias Sattler: Innovator in Screening Technology

Introduction

Matthias Sattler is a notable inventor based in Bensheim, Germany. He has made significant contributions to the field of screening technology, particularly with his innovative designs and patents. His work has been instrumental in enhancing the efficiency and functionality of screening machines.

Latest Patents

Sattler holds a patent for a flip-flow screener machine with optimized screen bottom fastening. This invention features a carrier frame that induces primary vibrations, coupled with a vibrating frame that oscillates freely. The design includes transverse carriers arranged on both the carrier and vibrating frames, with a flexible screen bottom secured between them. Each screen bottom has an undercut portion that allows it to engage with the transverse carrier, ensuring a secure fit. This innovative design improves the performance and reliability of screening processes.

Career Highlights

Throughout his career, Matthias Sattler has worked with prominent companies in the industry, including Hein, Lehmann GmbH and Isenmann Siebe GmbH. His experience in these organizations has allowed him to refine his skills and contribute to the development of advanced screening technologies.

Collaborations

Sattler has collaborated with notable colleagues such as Rolf Kadel and Peter Palmen. These partnerships have fostered innovation and have been crucial in the advancement of screening technology.

Conclusion

Matthias Sattler's contributions to the field of screening technology through his patent and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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