Giessen, Germany

Matthias Pietsch

This inventor holds 1 USPTO granted patent. Top assignee: Institut Fuer Neue Materialen Gemeinnuetzige Gmbh. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthias Pietsch. Retrieved from https://idiyas.com/inventor/matthias-pietsch-j90if21o

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Matthias Pietsch: Innovator in Transparent Coatings

Introduction

Matthias Pietsch is a notable inventor based in Giessen, Germany. He has made significant contributions to the field of materials science, particularly in the development of substrates with transparent and color coatings. His innovative approach has led to advancements that are valuable in various applications.

Latest Patents

Matthias Pietsch holds a patent for a "Method for manufacturing substrates with transparent and color coatings." This patent showcases his expertise in creating materials that enhance both functionality and aesthetic appeal.

Career Highlights

Pietsch is associated with the Institut für Neue Materialien Gemeinnützige GmbH, where he continues to push the boundaries of material innovation. His work has been instrumental in advancing the capabilities of modern substrates.

Collaborations

Matthias has collaborated with esteemed colleagues, including Klaus Endres and Marion Lindenstruth. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Matthias Pietsch is a dedicated inventor whose work in transparent coatings exemplifies innovation in materials science. His contributions continue to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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