This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sika Technology Ag. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: Innovations by Matthias Heidtmann in Polyurethane Composition
Introduction
Matthias Heidtmann is a notable inventor based in Lübeck, Germany. He has made significant contributions to the field of materials science, particularly in the development of polyurethane compositions. His innovative work has led to the creation of a unique two-component polyurethane composition that exhibits remarkable properties.
Latest Patents
Heidtmann holds a patent for a two-component polyurethane composition. This invention consists of a first and a second component, where the first component includes an alkoxylated aromatic diol, a low molecular weight aliphatic or cycloaliphatic diol, and a specific polybutadiene polyol in defined ratios. The cured composition is characterized by excellent adhesive characteristics, with strength that remains relatively stable across a temperature range of -35 to +85 degrees Celsius. This makes it particularly suitable as a structural adhesive for bonding two substrates.
Career Highlights
Matthias Heidtmann is associated with Sika Technology AG, a company known for its innovative solutions in construction and industry. His work at Sika has allowed him to focus on developing advanced materials that meet the demands of modern applications.
Collaborations
Heidtmann has collaborated with notable colleagues such as Wolfgang Roock and Steffen Kelch. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Matthias Heidtmann's contributions to the field of polyurethane compositions highlight his innovative spirit and dedication to advancing material science. His patented work continues to influence the industry, showcasing the importance of research and collaboration in driving technological progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
