Hochheim am Main, Germany

Matthias Finke

This inventor holds 1 USPTO granted patent. Top assignee: Ma Lighting Technology Gmbh. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthias Finke. Retrieved from https://idiyas.com/inventor/matthias-finke-l3im3210

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Matthias Finke: Innovator in Lighting Technology

Introduction

Matthias Finke is a notable inventor based in Hochheim am Main, Germany. He has made significant contributions to the field of lighting technology, particularly through his innovative patent that enhances the functionality of headlamps.

Latest Patents

Finke holds a patent for a method and device that emulates a spotlight partially covered by a mask. This invention allows for a lighting design that is independent of any pre-settings in headlamps, utilizing inexpensive and readily available lighting components. The process involves retrieving a two-dimensional pattern from a memory based on a lighting control protocol and transforming it according to specific channel values. The transformed pattern is then converted into a raster image, which is output as a headlight using a digital projector. This innovative approach results in pattern pixels that are at least 20% brighter than the surrounding areas.

Career Highlights

Matthias Finke is associated with MA Lighting Technology GmbH, a company known for its advancements in lighting solutions. His work there has focused on developing technologies that improve lighting design and control, making significant strides in the industry.

Collaborations

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Conclusion

Matthias Finke's contributions to lighting technology through his innovative patent demonstrate his commitment to enhancing the functionality and design of lighting systems. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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