Hildesheim, Germany

Matthias Ehm

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Robert Bosch. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthias Ehm. Retrieved from https://idiyas.com/inventor/matthias-ehm-oa58z06m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Matthias Ehm and Sensor Field-of-View Monitoring.

Introduction

Matthias Ehm is an inventor associated with Hildesheim, Germany, and Robert Bosch. His work includes a patent for monitoring changes within the field of view of a stationary sensor.

Latest Patents

Ehm is named on one patent, titled “Method and Device for Monitoring a Field of View of a Stationary Sensor.” The invention describes receiving sensor recordings captured at different times during a predefined measurement period and identifying measurement points that represent the positions or dimensions of objects in the sensor’s surroundings. It groups those points according to a similarity metric, represents each group with a prototype, and compares the prototypes with reference data to detect changes in the sensor’s field of view. The reference data is based on a prior state of the sensor and its surroundings. Ehm’s reported patent portfolio comprises 1 patent.

Career Highlights

Ehm’s listed company affiliation is Robert Bosch. The patent reflects work on using sensor data and comparisons with reference measurements to identify changes in a monitored environment.

Collaborations

Sebastian Nusser is identified as Ehm’s coworker. The available information does not specify his role in the patent or the nature of their collaboration.

Conclusion

Matthias Ehm’s documented invention focuses on detecting changes in a stationary sensor’s field of view by analyzing and comparing grouped measurement data.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…