Bernstadt, Germany

Matthias Allgaier

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 1.4

ph-index = 3

Forward Citations = 35(Granted Patents)


Location History:

  • Langenau, DE (2014)
  • Bernstadt, DE (2014 - 2019)
  • Ittlingen, DE (2023)

Company Filing History:


Years Active: 2014-2023

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7 patents (USPTO):Explore Patents

Title: Matthias Allgaier: Innovator in Integration Technologies

Introduction

Matthias Allgaier is a notable inventor based in Bernstadt, Germany. He has made significant contributions to the field of integration technologies, holding a total of 7 patents. His work focuses on enhancing the efficiency and effectiveness of application integration through innovative methods and systems.

Latest Patents

Among his latest patents, the "Integration Component Assessment" stands out. This patent describes systems and methods for determining the integration style of interfaces between applications, analyzing message flows, and assessing integration components based on key characteristic values. Another significant patent is the "Controlled Reference Process Extensibility Framework," which outlines methods for querying extension point information and providing extension patterns for core process models. This framework allows for user-defined extensions to be integrated into core process models, enhancing their functionality and adaptability.

Career Highlights

Throughout his career, Matthias has worked with prominent companies such as SAP SE and SAP AG. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in integration technologies.

Collaborations

Matthias has collaborated with notable colleagues, including Markus Heller and Uwe Kylau. These partnerships have fostered a creative environment that has led to the development of impactful technologies.

Conclusion

Matthias Allgaier's contributions to integration technologies through his patents and collaborations highlight his role as a significant innovator in the field. His work continues to influence the way applications interact and integrate, paving the way for future advancements.

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