This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: General Electric Company. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: The Innovative Contributions of Matthew Vaughan Schulmerich
Introduction
Matthew Vaughan Schulmerich is a notable inventor based in Niskayuna, NY (US). He has made significant contributions to the field of laser technology, particularly in the area of laser ablation and spectroscopy. His work has implications for various industries, including aerospace and materials science.
Latest Patents
Schulmerich holds a patent for a system and method for performing laser induced breakdown spectroscopy during laser ablation coating removal. This innovative system enables real-time monitoring and control of the laser ablation removal process. The technology includes a laser energy source and a scan head that directs the laser beam onto the surface of a coated component. The collection optics are designed to gather radiation emitted from a laser-induced plasma, which is then spectrally analyzed to generate feedback signals for optimizing operational parameters.
Career Highlights
Matthew Schulmerich is associated with General Electric Company, where he has been instrumental in advancing laser technologies. His expertise in laser-induced breakdown spectroscopy has positioned him as a key figure in the development of systems that enhance the efficiency and effectiveness of coating removal processes.
Collaborations
Schulmerich has collaborated with notable colleagues, including Ying Zhou and Hongqiang Chen. These partnerships have contributed to the advancement of innovative technologies in their respective fields.
Conclusion
Matthew Vaughan Schulmerich's contributions to laser technology and his innovative patent demonstrate his commitment to advancing scientific knowledge and practical applications. His work continues to influence the industry and pave the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
