Cambridge, United Kingdom

Matthew Richard Palmer

This inventor holds 1 USPTO granted patent. Top assignee: Agfa-Gevaert. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthew Richard Palmer. Retrieved from https://idiyas.com/inventor/matthew-richard-palmer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Matthew Richard Palmer: Innovator in Label-Printing Technology

Introduction

Matthew Richard Palmer is a notable inventor based in Cambridge, GB. He has made significant contributions to the field of label-printing technology, particularly through his innovative processes that enhance the efficiency and effectiveness of printing on various materials.

Latest Patents

Matthew holds a patent for a "Label-printing process for substantially light-insensitive elongated materials including an organic silver salt." This invention showcases his expertise in developing advanced printing techniques that cater to specific material properties.

Career Highlights

Matthew is currently employed at Agfa-Gevaert, a company renowned for its imaging and printing solutions. His work at Agfa-Gevaert has allowed him to apply his inventive skills in a practical setting, contributing to the company's reputation for innovation in the industry.

Collaborations

Throughout his career, Matthew has collaborated with talented individuals such as Anthony Roy Dunn and Krystyna Maria Windle. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Matthew Richard Palmer is a distinguished inventor whose work in label-printing technology has made a significant impact in his field. His innovative spirit and collaborative efforts continue to drive advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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