This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Ahlstrom Oyj. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Matthew Jeon: Inventor of Flue Gas Filtration Media
Introduction
Matthew Jeon is an inventor associated with Daegu, South Korea. His patent work addresses filtration materials designed to withstand demanding flue gas conditions.
Latest Patents
Jeon is associated with 1 patent, titled “Flue Gas Filtration Media.” The invention describes a non-woven fibrous web made primarily from meta-aramid fibers, with meta-aramid fibrids included to support the web’s structure and performance.
The disclosed medium can be designed with an average pore size of 20 to 80 micrometers and a maximum pore size of 100 micrometers. Its stated performance characteristics include a dry Mullen burst strength of at least 7 kg/cm, retention of 80 percent of that strength after acid cycling, filtration efficiency of at least 95 percent for 2.5-micrometer particles, and shrinkage below 2 percent after heating at 205°C for two hours.
The manufacturing method involves wet-laying a mixture of meta-aramid fibers and fibrids, then drying it to form the web. The process may also include calendering, resin saturation, and curing.
Career Highlights
Jeon’s listed company affiliations include Ahlstrom Oyj and Ahlstrom-Munksjö Oyj. These companies are associated with materials and filtration technologies, providing relevant industry context for his patent on flue gas filtration media.
Collaborations
Jesse Shim and Taylor Lee are identified as Jeon’s coworkers. Their shared professional context reflects connections within the broader materials and filtration field.
Conclusion
Matthew Jeon’s patent presents a meta-aramid-based filter medium designed to combine particle filtration, mechanical strength, and resistance to heat and acid exposure.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile