Rochester, United Kingdom

Matthew James Rendell

This inventor holds 1 USPTO granted patent. Top assignee: Bae Systems, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthew James Rendell. Retrieved from https://idiyas.com/inventor/matthew-james-rendell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Matthew James Rendell: Augmented Reality Display Coordination

Introduction

Matthew James Rendell is an inventor based in Rochester, Great Britain, associated with BAE Systems, Inc. His patent work addresses how augmented reality information can be coordinated across different types of displays.

Latest Patents

Rendell is named on 1 patent: “System and Method for Coordinated Symbology in an Augmented Reality System.” The invention describes a display system with at least two different display types and a control system that determines whether relevant symbology is available, identifies where it should appear in a real-world view, and displays it in the corresponding position on one or both displays. This approach is intended to coordinate visual information across displays while maintaining its positional relationship to the environment.

Career Highlights

Rendell’s listed patent reflects work on augmented reality systems and the presentation of contextually positioned information. His association with BAE Systems, Inc. connects this invention to the company’s technology development activities.

Collaborations

The provided information also names Jason Rodney Garnham and Lee Peter Frederick Baker as Rendell’s coworkers. Their specific roles in the patent or related work are not stated.

Conclusion

Matthew James Rendell’s patent focuses on coordinating augmented reality symbology across different display types, helping place digital information in alignment with the real-world environment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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