Lexington, KY, United States of America

Matthew J Riley

This inventor holds 2 USPTO granted patents. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2018-2020.


% Patents Active = 50.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018-2020

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2 patents (USPTO):Explore Patents

Title: Matthew J Riley: Innovator in Machine Readable Instructions

Introduction

Matthew J Riley is an accomplished inventor based in Lexington, KY (US). He has made significant contributions to the field of technology, particularly in the area of machine readable instructions. With a total of 2 patents to his name, Riley's work has garnered attention for its innovative approach to backward compatibility in machine instructions.

Latest Patents

Riley's latest patents focus on machine readable instructions backward compatibility. According to his patent, this technology involves determining changes between first and second sets of machine readable instructions and generating a backward compatibility switch. This switch can be implemented in the second set of instructions to selectively revert functionality to that of the first set, ensuring seamless operation across different versions of machine instructions.

Career Highlights

Matthew J Riley is currently employed at Hewlett-Packard Development Company, L.P. His role at HP allows him to work on cutting-edge technology and contribute to advancements in the field. His expertise in machine readable instructions has positioned him as a valuable asset within the company.

Collaborations

Riley has collaborated with notable colleagues such as Joshua M Moore and Eric Todd Debusschere. These partnerships have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Matthew J Riley's contributions to machine readable instructions highlight his innovative spirit and dedication to technology. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
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