Company Filing History:
Years Active: 2017
Title: Matthew J Pinnow: Innovator in Photoresist Technology
Introduction
Matthew J Pinnow is a notable inventor based in Milwood, NY (US). He has made significant contributions to the field of photoresist technology, particularly through his innovative patent related to surfactants.
Latest Patents
Matthew holds a patent for "Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions." This patent describes a method of modifying the surface of a photoresist material by exposing it to an aqueous ionic surfactant solution. The process involves varying the pH of the solution until a fluorochemical layer is formed in or on the photoresist material. The solution includes a perfluoroalkyl sulfonamide with the formula: RS0NH—R', where R=CF— and n=1 to 6, and R' can be —H, —CH, or —CHCHOH. The pH of the aqueous ionic surfactant solution is maintained within about 3 pH units of the pKa of the perfluoroalkyl sulfonamide. Matthew has 1 patent to his name.
Career Highlights
Matthew is currently employed at 3M Innovative Properties Company, where he continues to develop and refine technologies related to photoresist materials. His work has been instrumental in advancing the capabilities of photoresist applications in various industries.
Collaborations
Some of Matthew's coworkers include Jason M Kehren and Patricia M Savu, who contribute to the innovative environment at 3M Innovative Properties Company.
Conclusion
Matthew J Pinnow is a key figure in the field of photoresist technology, with a focus on surfactants that enhance material properties. His contributions through patents and collaboration with colleagues highlight his commitment to innovation in this specialized area.