Cardiff, United Kingdom

Matthew Geen

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Iqe Plc. Active years: 2026.


% Patents Active = 100.0

 

Average Co-Inventor Count = 1.3

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Matthew Geen: Innovator in Group V Precursor Processes

Introduction

Matthew Geen is a notable inventor based in Cardiff, GB. He has made significant contributions to the field of materials science, particularly in the development of methods for forming layers using mixed Group V precursors. His innovative approach has implications for improving manufacturing efficiency and reducing costs in various applications.

Latest Patents

Matthew Geen holds a patent for a "Method and system for mixed group V precursor process." This patent describes a method of forming a layer that includes introducing a Group III precursor in a reactor, along with both a hydride Group V precursor and a metal-organic Group V precursor. The method enhances uniformity, decreases thermal sensitivity of the end material, normalizes concentration profiles of precursors, improves yield, and increases manufacturing efficiency. Additionally, it allows for better control of III-V ratios and reduces manufacturing costs.

Career Highlights

Matthew Geen is currently employed at IQE Plc, a company known for its expertise in advanced semiconductor materials. His work at IQE has positioned him as a key player in the development of innovative processes that leverage mixed Group V precursors. His contributions have been instrumental in advancing the company's technological capabilities.

Collaborations

Matthew collaborates with various professionals in his field, including his coworker Rodney Pelzel. Their combined expertise fosters an environment of innovation and progress within the company.

Conclusion

Matthew Geen's work in the field of mixed Group V precursor processes exemplifies the impact of innovative thinking on manufacturing efficiency and cost reduction. His contributions continue to shape advancements in materials science and semiconductor technology.

Profile summary based on public USPTO records.
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