Matthew Flaugh

Title: Innovations of Matthew Flaugh

Introduction

Matthew Flaugh is an accomplished inventor based in Albany, NY (US). He has made significant contributions to the field of microelectronics, particularly in the area of etching technologies. With a total of 3 patents to his name, Flaugh's work has advanced the capabilities of silicon and silicon-germanium alloys.

Latest Patents

Flaugh's latest patents include innovative methods for selective and isotropic etching of silicon over silicon-germanium alloys and dielectrics. One of his notable inventions involves selective protection and etching, which can be utilized in etching a silicon-containing layer with respect to a Ge or SiGe layer. This process includes a treatment that modifies the surface of the Ge/SiGe layers, followed by a heat treatment to selectively sublimate layer portions on the side surfaces of the silicon-containing layers. Additionally, he has developed a gas phase etch method that allows for the dry removal of materials on microelectronic workpieces, utilizing a controlled gas-phase environment containing an anhydrous halogen compound.

Career Highlights

Matthew Flaugh is currently employed at Tokyo Electron Limited, where he continues to innovate in the field of microelectronics. His work has been instrumental in enhancing the efficiency and effectiveness of etching processes, which are critical in semiconductor manufacturing.

Collaborations

Flaugh has collaborated with notable colleagues, including Aelan Mosden and Subhadeep Kal, contributing to a dynamic and innovative work environment.

Conclusion

Matthew Flaugh's contributions to the field of microelectronics through his patents and collaborative efforts highlight his role as a leading inventor. His innovative approaches to etching technologies continue to shape the industry and pave the way for future advancements.