Matthew E Colburn

Title: Matthew E Colburn: Innovator in Etch Masking Technology

Introduction

Matthew E Colburn is a notable inventor based in Schenectady, NY (US). He has made significant contributions to the field of etch masking technology, particularly through his innovative patent. With a focus on precision and efficiency, Colburn's work has implications for various applications in semiconductor manufacturing.

Latest Patents

Colburn holds a patent titled "Self aligned pattern formation post spacer etchback in tight pitch configurations." This patent describes a method of forming a structure for etch masking. The process includes forming first dielectric spacers on the sidewalls of a plurality of mandrel structures and creating non-mandrel structures in the space between adjacent first dielectric spacers. Additionally, second dielectric spacers are formed on the sidewalls of an etch mask that has a window exposing a connecting portion of a centralized first dielectric spacer. The method allows for the selective removal of mandrel and non-mandrel structures to provide an effective etch mask. This innovative approach enhances the efficiency of semiconductor fabrication processes.

Career Highlights

Colburn's career is marked by his dedication to advancing etch masking techniques. His work at Tessera LLC has positioned him as a key player in the industry. With a focus on developing cutting-edge technologies, he has contributed to the evolution of semiconductor manufacturing processes.

Collaborations

Colburn has collaborated with notable colleagues, including Sean D Burns and Lawrence Alfred Clevenger. These partnerships have fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Matthew E Colburn is a distinguished inventor whose work in etch masking technology has made a significant impact on semiconductor manufacturing. His innovative patent and collaborative efforts highlight his commitment to advancing the industry.