Saucier, MS, United States of America

Matthew Chavana, Jr

This inventor holds 1 USPTO granted patent. Top assignee: Oreck Holdings, LLC. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthew Chavana, Jr. Retrieved from https://idiyas.com/inventor/matthew-chavana-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Matthew Chavana, Jr.

Introduction

Matthew Chavana, Jr. is an inventive mind hailing from Saucier, MS (US). He has made significant contributions to the field of cleaning technology through his innovative designs. His work exemplifies the spirit of innovation that drives progress in various industries.

Latest Patents

Matthew Chavana, Jr. holds a patent for an "Orbital brush for an orbital floor brush machine." This invention features a brush frame designed to fit an orbital floor brush machine. It includes a first ring of bristle tufts of a specific length and orientation, as well as a second ring of bristle tufts with different specifications. This design enhances the efficiency and effectiveness of floor cleaning machines.

Career Highlights

Matthew is currently associated with Oreck Holdings, LLC, a company known for its commitment to quality in the cleaning industry. His role at Oreck allows him to apply his inventive skills to develop products that meet consumer needs. His patent reflects his dedication to improving cleaning technology.

Conclusion

Matthew Chavana, Jr. is a notable inventor whose work in cleaning technology has made a significant impact. His innovative designs, particularly the orbital brush, showcase his commitment to enhancing product functionality. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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