Cheadle Hulme, United Kingdom

Matthew Arnold Hepworth

This inventor holds 1 USPTO granted patent. Top assignee: T&n Technology Limited. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthew Arnold Hepworth. Retrieved from https://idiyas.com/inventor/matthew-arnold-hepworth

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Matthew Arnold Hepworth: Innovator in Silicon Nitride Technology

Introduction

Matthew Arnold Hepworth is a notable inventor based in Cheadle Hulme, GB. He has made significant contributions to the field of materials science, particularly in the development of advanced ceramic components. His innovative work has led to the creation of a patented technology that enhances the performance of silicon nitride materials.

Latest Patents

Matthew holds a patent for "Sintered reaction-bonded silicon nitride components." This invention represents a breakthrough in the manufacturing of durable and high-performance materials, which are essential in various industrial applications.

Career Highlights

Matthew is currently employed at T&N Technology Limited, where he continues to push the boundaries of material innovation. His work at the company has been instrumental in advancing the capabilities of silicon nitride components, making them more efficient and reliable for use in demanding environments.

Collaborations

Throughout his career, Matthew has collaborated with talented individuals such as Robert Alan Wordsworth and Carol Jayne Pindar. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Matthew Arnold Hepworth is a distinguished inventor whose work in silicon nitride technology has made a lasting impact on the industry. His dedication to innovation and collaboration continues to inspire advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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