Matt Cheng-Hsiung Tsai

Title: Matt Cheng-Hsiung Tsai: Innovator in Plasma Cleaning Technology

Introduction

Matt Cheng-Hsiung Tsai is a notable inventor based in Cupertino, CA. He has made significant contributions to the field of plasma cleaning technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of plasma cleaning processes.

Latest Patents

One of his latest patents is for a "Plasma cleaning apparatus and method." This invention includes an apparatus designed for plasma cleaning, featuring a lid body with a first surface facing a pedestal and a second surface that includes an indentation for a magnet assembly. The method involves several steps, including removing a sputtering target, sealing the processing chamber, and applying an RF bias to maintain a constant temperature while cleaning the pedestal.

Another significant patent is for a "Heated cooling plate for E-chucks and pedestals." This invention provides a method and apparatus for controlling the temperature of a substrate support assembly. It includes a cooling plate structure and a heater, both thermally coupled to ensure optimal temperature regulation during substrate processing.

Career Highlights

Matt Cheng-Hsiung Tsai is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to develop innovative solutions that enhance the performance of plasma cleaning technologies.

Collaborations

Some of his notable coworkers include Martin Deehan and Nan Lu, who have collaborated with him on various projects within the company.

Conclusion

Matt Cheng-Hsiung Tsai is a prominent inventor whose work in plasma cleaning technology has led to significant advancements in the field. His contributions continue to impact the semiconductor industry positively.