Vaster.ang.s, Sweden

Mats Gardin

This inventor holds 1 USPTO granted patent. Top assignee: Asea Brown Boveri Ab. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mats Gardin. Retrieved from https://idiyas.com/inventor/mats-gardin-85iwjlns

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1998

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Mats Gardin: A Pioneer in High Pressure Treatment

Introduction

Mats Gardin, an innovative inventor based in Vasterang, Sweden, has made notable strides in the field of high-pressure technology. With a passion for advancing industrial processes, he holds one patent that highlights his commitment to innovation.

Latest Patents

Mats Gardin's significant contribution to the industry is encapsulated in his patent titled "High Pressure Press and Method for High Pressure Treatment of Substances." This invention focuses on enhancing the efficiency and efficacy of high-pressure treatments, which have applications in numerous industrial processes.

Career Highlights

Mats Gardin is associated with Asea Brown Boveri AB, a prominent company known for its engineering and technology solutions. His role there has allowed him to engage with cutting-edge projects and collaborate with experts in the field.

Collaborations

In his journey of innovation, Mats collaborates closely with his coworker, Carl Bergman. Together, they harness their expertise to push the boundaries of technology and develop solutions that meet the evolving demands of the industry.

Conclusion

Mats Gardin is a remarkable inventor whose contributions to high-pressure technology have the potential to enhance various industrial applications. With his innovative mindset and collaborative spirit, he continues to inspire future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…