Matias Kagias

Title: Matias Kagias: Innovator in Photonic Device Fabrication

Introduction

Matias Kagias is a prominent inventor based in Zurich, Switzerland. He has made significant contributions to the field of photonic devices, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents is titled "System and method for fabricating photonic device elements." This invention focuses on the fabrication of elements with high aspect ratio patterns. It utilizes a stabilizing catalyst that forms a stable metal-semiconductor alloy, allowing for vertical etching of a substrate even at low oxidant concentrations without the need for external bias or magnetic fields. The process involves a continuous flow of air at the metal layer, which maintains a constant oxidant concentration, enabling the formation of very high aspect ratio structures.

Another notable patent is "Omnidirectional scattering- and bidirectional phase-sensitivity with single shot grating interferometry." This invention addresses the limitations of existing X-ray scattering imaging methods. It allows for the simultaneous acquisition of scattering images in all possible directions in a single shot, which is crucial for various medical and industrial applications.

Career Highlights

Matias Kagias is affiliated with the Paul Scherrer Institute, where he continues to advance research in photonic devices. His work has garnered attention for its innovative techniques and applications in the field.

Collaborations

He has collaborated with notable colleagues, including Marco Stampanoni and Zhentian Wang, contributing to the advancement of research in photonics.

Conclusion

Matias Kagias is a key figure in the innovation of photonic device fabrication, with patents that reflect his expertise and dedication to advancing technology. His contributions are paving the way for future developments in the field.