CA

Mathieu Huneault

This inventor holds 1 USPTO granted patent. Top assignee: Exfo Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mathieu Huneault. Retrieved from https://idiyas.com/inventor/mathieu-huneault

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Mathieu Huneault and Optical Fiber Measurement Innovation.

Introduction

Mathieu Huneault is an inventor associated with EXFO Inc. in Canada. His patent work addresses the measurement of polarization mode dispersion in optical fiber.

Latest Patents

Huneault is associated with 1 patent: “Method and Apparatus of Single-Ended Polarization Mode Dispersion Measurement.” The invention describes a method and system for measuring polarization mode dispersion (PMD) in a fiber under test. A polarization-sensitive optical time-domain reflectometer sends repeated light pulses into the fiber and analyzes the returning light reflected from a reflector at the fiber’s far end. By comparing acquisitions made at closely spaced wavelengths with substantially the same state of polarization, the system can calculate PMD. The process can also use multiple wavelength pairs and polarization states to obtain the measurement.

Career Highlights

Huneault’s listed patent reflects work on optical-fiber testing and measurement technology. The approach is designed to measure PMD from one end of the fiber, using polarization-sensitive optical signals and their reflections.

Collaborations

Huneault’s listed coworkers include Yves Breton and Hongxin Chen. The patent is associated with EXFO Inc.

Conclusion

Mathieu Huneault’s patent contribution focuses on a single-ended technique for measuring polarization mode dispersion in optical fiber, supporting the development of fiber-testing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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