Wayne, NJ, United States of America

Mathieu Bariou

This inventor holds 1 USPTO granted patent. Top assignee: Reckitt Benckiser Inc.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mathieu Bariou. Retrieved from https://idiyas.com/inventor/mathieu-bariou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Mathieu Bariou

Introduction

Mathieu Bariou is an accomplished inventor based in Wayne, NJ (US). He has made significant contributions to the field of cleaning technology, particularly with his innovative lavatory cleaning device. His work exemplifies the spirit of innovation that drives advancements in everyday products.

Latest Patents

Mathieu holds 1 patent for his lavatory cleaning device. This invention showcases his ability to identify practical solutions to common problems, enhancing the efficiency and effectiveness of cleaning processes.

Career Highlights

Currently, Mathieu is employed at Reckitt Benckiser Inc., a leading company in consumer health and hygiene products. His role at the company allows him to apply his inventive skills to develop products that improve the quality of life for consumers.

Collaborations

Throughout his career, Mathieu has collaborated with talented individuals such as Ann Bongiorno and Leonard Spitzer. These partnerships have fostered a creative environment that encourages the exchange of ideas and innovation.

Conclusion

Mathieu Bariou's contributions to the field of cleaning technology through his lavatory cleaning device highlight his inventive spirit and dedication to improving everyday products. His work at Reckitt Benckiser Inc. and collaborations with colleagues further emphasize his commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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