Newark, DE, United States of America

Matheswaran Marudachalam


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 33(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Matheswaran Marudachalam: Innovator in Semiconductor Technology

Introduction

Matheswaran Marudachalam is a notable inventor based in Newark, DE (US). He has made significant contributions to the field of semiconductor technology, particularly in the production of semiconducting films. His work is essential for advancements in photovoltaic applications, especially in solar energy.

Latest Patents

Marudachalam holds a patent for a process titled "Process for preparing group Ib-IIIa-VIa semiconducting films." This innovative method involves the production of supported monophasic group I-III-VI semiconductor films. The process includes coating a substrate with group I and III elements, followed by exposure to a reactive group VI element atmosphere. This technique results in a composite coating that is subsequently annealed to create a monophasic semiconductor film. The films produced through this method are particularly useful as absorber layers in solar cells.

Career Highlights

Marudachalam is affiliated with the University of Delaware, where he continues to advance research in semiconductor technologies. His work has garnered attention for its potential applications in renewable energy solutions. With a focus on innovative methods, he has contributed to the development of technologies that enhance the efficiency of solar energy systems.

Collaborations

Throughout his career, Marudachalam has collaborated with esteemed colleagues, including Robert W. Birkmire and Jerold M. Schultz. These partnerships have fostered a collaborative environment that promotes innovation and research excellence.

Conclusion

Matheswaran Marudachalam's contributions to semiconductor technology and renewable energy are noteworthy. His innovative patent and collaborative efforts at the University of Delaware highlight his commitment to advancing the field. His work continues to impact the development of efficient solar energy solutions.

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