Tateyama, Japan

Masushi Taki

This inventor holds 1 USPTO granted patent. Top assignee: Nippon Steel Semiconductor Corporation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masushi Taki. Retrieved from https://idiyas.com/inventor/masushi-taki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Masushi Taki: Innovator in Semiconductor Fabrication

Introduction

Masushi Taki is a prominent inventor based in Tateyama, Japan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in semiconductor device fabrication.

Latest Patents

Masushi Taki holds 1 patent for a method of fabricating a semiconductor device with an LDD structure. This patent outlines a comprehensive process that includes several steps, such as forming an electrically insulating layer, creating a conductive layer, and patterning a photoresist layer. The method also details the formation of gate electrodes and the introduction of ions to create heavily and lightly doped regions.

Career Highlights

Masushi Taki is associated with Nippon Steel Semiconductor Corporation, where he applies his expertise in semiconductor fabrication. His work has been instrumental in enhancing the efficiency and performance of semiconductor devices.

Conclusion

Masushi Taki's contributions to semiconductor technology exemplify the importance of innovation in the field. His patented methods continue to influence the industry and drive advancements in semiconductor device fabrication.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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