Fussa, Japan

Masuo Suzuki


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 99(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Innovator in Chemical Vapor Deposition: Masuo Suzuki

Introduction: Masuo Suzuki, an esteemed inventor based in Fussa, Japan, has made significant contributions to the field of chemical engineering with his innovative patent related to chemical vapor deposition (CVD) technology. His approach to designing a compact and efficient CVD apparatus showcases his dedication to advancing this important area of research and application.

Latest Patents: Suzuki holds a patent for a chemical vapor deposition apparatus that features a reactor divided into a reaction space and a purging space. This apparatus incorporates a susceptor that supports a wafer, with a loading chamber connected to the reactor through a gate. The design includes integrated exhaust units that facilitate pressure reduction in both the reactor and loading chamber, enhancing the overall efficiency of the process. Furthermore, the susceptor is designed with multiple recesses to aid in the handling of the wafers, and is heated externally by a lamp unit through a transparent wall. This innovative design allows for the processing of one or a few wafers at a time, with high reproducibility and uniform film deposition.

Career Highlights: Masuo Suzuki has dedicated his professional life to advancing technology through his work at Nippon Telegraph and Telephone Public Corporation. His technical expertise and inventive spirit have paved the way for improvements in chemical processing and deposition methods, positioning him as a notable figure in the research and development community.

Collaborations: Throughout his career, Suzuki has worked alongside talented individuals such as Satoshi Nakayama and Hideaki Takeuchi. These collaborations have fostered an environment of innovation and shared knowledge, further enhancing the development of groundbreaking technologies in the field.

Conclusion: Masuo Suzuki stands out as a remarkable inventor whose work in chemical vapor deposition apparatus has made significant impacts. His innovative designs not only improve efficiency in wafer processing but also contribute to the advancement of technology in the chemical engineering sector. As he continues to collaborate with fellow innovators, Suzuki's influence on the industry is likely to grow, inspiring future generations of engineers and inventors.

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