Company Filing History:
Years Active: 1998-2000
Title: Masis Mkrtchyan: Innovator in Lithographic Processes
Introduction
Masis Mkrtchyan is a notable inventor based in Stirling, NJ (US), recognized for his contributions to the field of device fabrication through innovative lithographic processes. With a total of 2 patents, he has made significant strides in enhancing the efficiency and accuracy of device manufacturing.
Latest Patents
Masis Mkrtchyan's latest patents include a "Process for device fabrication using a variable transmission aperture" and a "Lithographic process for device fabrication utilizing back-scattered." The first patent describes a method that employs optical lithography to create a desired pattern in an energy-sensitive material. This process involves the use of a filter element with regions of varying transmittance, which are selected based on the desired pattern and the optical lithographic tool used. The second patent focuses on a lithographic process that utilizes electron beams for exposing radiation, allowing for precise alignment of silicon wafers through backscattered electron signals.
Career Highlights
Masis Mkrtchyan is currently associated with Lucent Technologies Inc., where he applies his expertise in lithography to advance device fabrication techniques. His work has contributed to the development of more efficient manufacturing processes in the technology sector.
Collaborations
Masis has collaborated with notable colleagues such as Reginald Conway Farrow and Raymond A Cirelli, enhancing the innovative capabilities within his team.
Conclusion
Masis Mkrtchyan's work in lithographic processes exemplifies the impact of innovation in device fabrication. His patents reflect a commitment to advancing technology and improving manufacturing efficiency.