Location History:
- Otake, JP (2004)
- Kanagawa, JP (2005)
Company Filing History:
Years Active: 2004-2005
Title: The Innovative Work of Masayuki Tooyama: Pioneering Chemical Amplification Resists
Introduction: Masayuki Tooyama is a notable inventor based in Kanagawa, Japan, recognized for his contributions to the field of chemical amplification resist compositions. With a total of two patents to his name, Tooyama's work showcases his expertise and innovative thinking in materials science.
Latest Patents: His latest inventions include a chemically amplified resist composition aimed at forming precise and fine resist patterns suitable for lithography using an ArF excimer laser beam. This composition comprises a resin that becomes soluble in an aqueous alkali solution in the presence of an acid, along with a photo acid generator and a specific amine derivative that acts as a quencher. Additionally, Tooyama developed a copolymer for use in paints and resists. This copolymer is synthesized by polymerizing monomers containing alicyclic structures and lactone structures, resulting in superior adhesion to high polarity surfaces like metal, excellent hydrophobic and thermal resistance, and favorable solubility in organic solvents.
Career Highlights: Masayuki Tooyama is affiliated with Mitsubishi Rayon Company, Limited, where he has been instrumental in advancing research and development in materials applicable in various industries. His focus on the development of effective resist technologies positions him at the forefront of innovation within his field.
Collaborations: Throughout his career, Tooyama has collaborated with talented individuals such as Tadayuki Fujiwara and Yukiya Wakisaka. These collaborations have fostered an environment of creativity and have contributed significantly to the success of their collective projects.
Conclusion: Masayuki Tooyama's innovative patents and collaborative efforts exemplify the spirit of invention in the realm of chemical amplification resist compositions. His work not only advances the technologies used in lithography but also demonstrates the impact of dedicated research in the field of materials science.